Atomic Layer Deposition for Semiconductors
ISBN/ASIN: 9781461480532,9781461480549 | 2014 | English | pdf | 263/265 pages | 6.43 Mb
Publisher: Springer US | Author: Cheol Seong Hwang, Cha Young Yoo (auth.), Cheol Seong Hwang (eds.) | Edition: 1
This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for memories covers both mass-produced memories, such as DRAM and Flash, and emerging memories, such as PCRAM and FeRAM. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes. The final section on ALD for machines looks at toolsets and systems hardware. Each chapter provides the history, operating principles, and a full explanation of ALD processes for each device.