Handbook of Thin-Film Deposition Processes and Techniques - Principles, Methods, Equipment and Applications Cover

Handbook of Thin-Film Deposition Processes and Techniques – Principles, Methods, Equipment and Applications

ISBN/ASIN: 9780815517788,9780815514428 | 2002 | English | pdf | 676/684 pages | 7.55 Mb
Publisher: William Andrew Publishing/Noyes | Author: Seshan, K.(eds.) | Edition: 2nd Edition

This book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues – as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on meterology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

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