Silicon Technologies  Ion Implantation and Thermal Treatment Cover

Silicon Technologies: Ion Implantation and Thermal Treatment

ISBN/ASIN: 9781848212312,9781118601044 | English | pdf | 347/347 pages | 17.6 Mb

Content:
Chapter 1 Silicon and Silicon Carbide Oxidation (pages 1–101): Jean?Jacques Ganem and Isabelle Trimaille
Chapter 2 Ion Implantation (pages 103–153): Jean?Jacques Grob
Chapter 3 Dopant Diffusion: Modeling and Technological Challenges (pages 155–207): Daniel Mathiot
Chapter 4 Epitaxy of Strained Si/Si1?x Gex Heterostructures (pages 209–331): Jean?Michel Hartmann

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