Characterization in Silicon Processing
ISBN/ASIN: 9780080523422,9780750691727 | 1993 | English | pdf | 240/249 pages | 10.8 Mb
Publisher: Elsevier | Author: Strausser, Yale
This book reviews techniques by which silicon processing engineers working with semiconductors can meet the demands for improved material quality and performance made necessary by increasingly stringent requirements, such as decreasing barrier film thicknesses. Among the techniques described are monitoring the effectiveness of surface cleaning processes; determining the amount of silicon consumption during barrier film and silicide growth; and silicon selective epitaxial growth.