Ionized-Cluster Beam Deposition and Epitaxy Cover

Ionized-Cluster Beam Deposition and Epitaxy

ISBN/ASIN: 9780815518174,9780815511687,081551817X | 1988 | English | rar | 236/0 pages | 10.3 Mb
Publisher: William Andrew Publishing/Noyes | Author: Takagi, T.

The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented in a single volume to give a coherent presentation to all those interested or working in the field. ICB processes are well characterized, and reliable equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.
Content:
Front Matter
• Preface
• Table of Contents
• 1. Introduction to Ionized-Cluster Beams
2. The Ionized-Cluster Beam Deposition System
3. Formation and Characteristics of Clusters
4. Film Formation Mechanisms
5. Properties of ICB-Deposited Films
6. ICB and Sputter Deposition
• 7. Conclusion
• References
Index

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Ionized-Cluster Beam Deposition and Epitaxy

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